Nano Materials LPCVD

Tystar Corporation has been working with universities and national labs to develop recipes for nano materials CVD for the past 30 years. A variety of nano materials can be produced using Tystar furnaces or non-thermal reactors either either under LPCVD or APCVD conditions.

• CLICK HERE FOR THE DETAILS OF NANO WIRES CVD.
• CLICK HERE FOR THE DETAILS OF NANOTUBES CVD.
• CLICK HERE FOR THE DETAILS OF GRAPHENE CVD.

For the details of other nano materials CVD, please contact 7050 Lampson Avenue Garden Grove, CA 92841 | Tel: (310) 781-9219 or write to sales@tystar.com

LPCVD Processes

• Silicon Carbide Devices
• Silicon Nitride Resonators
• Doped Silicon by LPCVD
• POLYSILICON LPCVD WITH SILANE (SiH₄)
• POLYSILICON LPCVD WITH DISILANE (Si₂H₆)
• LTO, DOPED LTO, BPSG, BSG, AND PSG LPCVD
• HTO LPCVD
• TEOS LPCVD
• Silicon Nitride LPCVD
• Low-Stress Silicon Nitride LPCVD
• Stochiometric Silicon Nitride LPCVD
• Silicon Oxynitride (SiN_xO_y) LPCVD
• Silicon Germanium (Si-Ge) LPCVD
• SIPOS (Semi-Insulating Polycrystalline Silicon)
• Polycrystalline Silicon Carbide
• Epitaxial Silicon
• Nano Materials LPCVD