Atmospheric Processes

TYTAN Furnace systems can be used for all conventional atmospheric pressure processes employed in the semiconductor industry. Processes run at temperatures above 1150°C require a thicker wall quartz tube, a SiC liner for the tube, SiC wafer boats, and SiC cantilever rods.

• Silicon Carbide Devices
• Silicon Dioxide Resonators
• Wet Oxidation
• Dry Oxidation with TLC Bubbler Cleaning Option
• Thick Thermal Oxides
• Diffusion of Solid Source Dopants
• POCL₃ or BBR₃ Liquid Source Dopant Diffusion
• Anneal
• Nano Materials LPCVD