Archive March 9, 2010
Marvell Microfabrication Laboratory Recognizes Tystar
March 9, 2010
Marvell Microfabrication Laboratory acknowledged that Tystar oxidation furnaces are qualified for the growth of quality gate oxides with a silicon-silicon dioxide interface charge density in the low 10 e10/cm2 level, as required for most microelectronic devices. Contamination control to this level also demonstrates the cleanliness of the new Wafab wet-process stations used for pre-furnace cleans, and validates the integrity of the lab-wide oxygen, nitrogen, and deionized.
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