Optical Furnace System

The FVD 2000 CVD reactor is for the fabrication of single-mode and multi-mode optical fiber preforms by the modified chemical vapor deposition process (MCVD). The FVD 2000 Gas delivery system is compact with a small foot print (approx. 950 mm wide and 800 mm deep). The FVD 2000 Gas Delivery system is designed for the production of single-mode and multi-mode fibers and offers a high dynamic range for the SiCl4 and GeCl4 vapor flows. Gas flow control precision of 2% and repeatability of <0.5% is achieved. High gas and vapor flow stability at continuous operation for more than 8 hours are met.

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